ADK STAB 329K by ADEKA is phosphite-based stabilizer. Provides good heat stability, color, process stability and weatherability to polymers. ADK STAB 329K is compatible with polyphenylene ether... view more

ADK STAB LA-51 by Adeka is benzophenone type UV absorber. It contains non-volatile content at high processing temperature. ADK STAB LA-51 shows excellent UV protection by scavenging radicals... view more

ADK STAB AO-30 by ADEKA Polymer Additives Europe is highly effective phenolic antioxidant. Offers long term thermal stability with outstanding extraction resistance. ADK STAB AO-30 is used for the... view more

BactiBlock® 920 B4 supplied by FARRL is an antimicrobial additive suitable to be used in a broad variety of polymeric products like thermosets, thermoplastics, elastomers and rubber. The product is... view more

Ken-React® KR® 12 supplied by FARRL is a titanate product based on titanium IV, class monoalkoxy, with phosphato functionality. It has low viscosity and solid content of min. 95%. It can be used in... view more

Ken-React® KR® TTS supplied by FARRL is a titanate product based on titanium IV, class monoalkoxy, with isostearoyl functionality. It has low viscosity and solid content of min. 95%. It helps in... view more

NORANTOX® 1010 by Nordmann, Rassmann is a high molecular weight, hindered phenolic antioxidant. It exhibits outstanding resistance to extraction from polymer compounds. It prevents molecular... view more

NORANTOX® 1076 by Nordmann, Rassmann is a high molecular weight, hindered phenolic antioxidant. It effectively reduces oxidative degradation of most polymeric substances. It is compatible with PE... view more

NORANTOX® UV 622 by Nordmann, Rassmann is a polymeric hindered amine light stabilizer of N-R type. It provides excellent thermal stability at normal processing temperature. It prevents molecular... view more

NORANTOX® UV 770 by Nordmann, Rassmann is a low molecular weight, hindered amine light stabilizer. It provides excellent light stability for thick sections as well as for applications with high... view more